Why order of filling is form more width filler cells to low width filler cells?
It forms the wide metal due to continuous placement of low width filler cells. Creates Metal slotting rule violation. The CMP damascene process also introduces undesirable side effects, including dielectric erosion and metal dishing.
Please always insert fat fillers first and then thin fillers afterwards. To avoid the metal-slot-rule violation, please do not only use thin filler cells to fill large I/O spacing. For example, use one 20um pitch filler cell (PFILLER20) and one 10um pitch filler cell (PFILLER10) instead of using 6 “5um pitch” filler cells (PFILLER5) to fill 30um spacing. In addition, if spacing is larger than one cell pitch, please first insert core power cell and I/O power cell. Then insert filler cells to fill up the rest of spacing for ESD robustness.
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